Trench pattern lithography for 0.13- and 0.10-μm logic devices at 248- and 193-nm wavelengths
- Author(s):
Wang,Y.-Y. ( Taiwan Semiconductor Manufacturing Co., Ltd. ) Lin,H.-T. Yu,S.-S. Chen,C.-K. Ku,Y.-C. Yen,A. Lin,B.J. - Publication title:
- Optical Microlithography XIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4346
- Pub. Year:
- 2001
- Vol.:
- 4346
- Pt.:
- One of Two Parts
- Page(from):
- 276
- Page(to):
- 292
- Pages:
- 17
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- Language:
- English
- Call no.:
- P63600/4346
- Type:
- Conference Proceedings
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