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Characterization of linewidth variation on 248- and 193-nm exposure tools

Author(s):
Gabor,A.H. ( IBM Microelectronics )
Brunner,T.A.
Chen,J.
Chen,N.
Deshpande,S.
Ferguson,R.A.
Horak,D.V.
Holmes,S.J.
Liebmann,L.W.
Mansfield,S.M.
Molless,A.F.
Progler,C.J.
Rabidoux,P.A.
Ryan,D.
Talvi,P.
Tsou,L.
Vampatella,B.R.
Wong,A.K.
Yang,Q.
Yu,C.
15 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. Year:
2001
Vol.:
4346
Pt.:
One of Two Parts
Page(from):
259
Page(to):
264
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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