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Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement

Author(s):
Schoot,J.B.van ( ASML )
Seong,N.
Geh,B.
Burkhardt,M.
Graupner,P.
Reisinger,G.
Rubingh,R.
Suddendorf,M.
Finders,J.
Rikkers,E.
5 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. Year:
2001
Vol.:
4346
Pt.:
One of Two Parts
Page(from):
229
Page(to):
240
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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