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Lithography process design for 4-Gb DRAM of 0.31 k1 with KrF

Author(s):
Park,J. ( Samsung Electronics Co., Ltd. )
Yeo,G.
Kim,I.
Kim,B.-S.
Lee,J.
Cho,H.
Moon,J.T.
2 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. Year:
2001
Vol.:
4346
Pt.:
One of Two Parts
Page(from):
205
Page(to):
213
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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