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100-nm node lithography with KrF?

Author(s):
Ferri,J.E. ( MIT Lincoln Lab. )
Tyrrell,B.
Astolfi,D.K.
Yost,D.
Davis,P.
Wheeler,B.
Mallen,R.
Jarmolowicz,J.
Cann,S.G.
Liu,H.Y.
Ma,M.
Chan,D.Y.
Rhyins,P.D.
Carney,C.
Blachowicz,B.A.
10 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. Year:
2001
Vol.:
4346
Pt.:
One of Two Parts
Page(from):
191
Page(to):
204
Pages:
14
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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