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ArF lithography options for 100-nm technologies

Author(s):
Vandenberghe,G.N. ( IMEC )
Kim,Y.-C.
Delvaux,C.
Lucas,K.D.
Choi,S.-J.
Ercken,M.
Ronse,K.
Vleeming,B.
3 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. date:
2001
Vol.:
4346
Pt.:
One of Two Parts
Page(from):
179
Page(to):
190
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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