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Can DUV take us below 100 nm?

Author(s):
Finders,J. ( ASML )
Jorritsma,L.
Eurlings,M.
Moerman,R.
Greevenbroek,H.van
Schoot,J.B.van
Flagello,D.G.
Socha,R.J.
Stammler,T.
4 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. date:
2001
Vol.:
4346
Pt.:
One of Two Parts
Page(from):
153
Page(to):
165
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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