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Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography

Author(s):
French,R.H. ( DuPont Co. )
Gordon,J.S.
Jones,D.J.
Lemon,M.F.
Wheland,R.C.
Zhang,E.
Zumsteg Jr.,F.C.
Sharp,K.G.
Qiu,W.
4 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. Year:
2001
Vol.:
4346
Pt.:
One of Two Parts
Page(from):
89
Page(to):
97
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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