Marathon evaluation of optical materials for 157-nm lithography

Marathon evaluation of optical materials for 157-nm lithography

Author(s):

Liberman,V. ( MIT Lincoln Lab. )

Publication title:

Optical Microlithography XIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4346

Pub. Year:

2001

Vol.:

4346

Pt.:

One of Two Parts

Page(from):

45

Page(to):

51

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

Language:

English

Call no.:

P63600/4346

Type:

Conference Proceedings

Details

TDL ID:	ZA00012062
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2001 : 14th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2001.02.27-2001.03.02

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1 Conference Proceedings Ambient effects on the laser durability of 157-nm optical coatings Liberman, V., Rothschild, M., Palmacci, S.T., Efremow, N.N., Jr., Sedlacek, J.H.C., Grenville, A. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Contamination rates of optical surfaces at 157 nm: impurities outgassed from construction materials and from photoresists Bloomstein, T.M., Sedlacek, J.H.C., Palmacci, S.T., Hardy, D.E., Liberman, V., Rothschild, M. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Accelerated damage to blank and antireflectance-coated CaF2 surfaces under 157-nm laser irradiation Liberman, V., Rothschild, M., Palmacci, S.T., Efremow, N.N., Jr., Sedlacek, J.H.C., Grenville, A. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Photo-induced changes in 157-nm optical coatings Liberman, V., Bloomstein, T.M., Rothschild, M., Palmacci, S.T., Sedlacek, J.H.C., Grenville, A. SPIE - The International Society of Optical Engineering
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