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"Novel chemically amplified positive resist containing acetal-type crosslinker of poly(3,3'-dimethoxypropene) for 193-nm top surface imaging process"

Author(s):
Koh,C.-W. ( Hyundai Electronics Industries Co., Ltd. )
Jung,J.-C.
Kim,M.-S.
Kong,K.-K.
Lee,G.
Jung,M.-H.
Kim,J.-S.
Shin,K.-S.
3 more
Publication title:
Advances in Resist Technology and Processing XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4345
Pub. Year:
2001
Vol.:
4345
Pt.:
Two of Two Parts
Page(from):
798
Page(to):
803
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440310 [0819440310]
Language:
English
Call no.:
P63600/4345
Type:
Conference Proceedings

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