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Design and performance of photoresist materials for ArF lithography

Author(s):
Kim,H.-W. ( Samsung Electronics Co., Ltd. )
Jung,D.-W.
Lee,S.
Choi,S.-J.
Woo,S.-G.
Kavanagh,R.J.
Barclay,G.G.
Blacksmith,R.F.
Kang,D.
Pohlers,G.
Cameron,J.F.
Mattia,J.
Caporale,S.
Penniman,T.
Joesten,L.A.
Thackeray,J.W.
11 more
Publication title:
Advances in Resist Technology and Processing XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4345
Pub. Year:
2001
Vol.:
4345
Pt.:
Two of Two Parts
Page(from):
776
Page(to):
783
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440310 [0819440310]
Language:
English
Call no.:
P63600/4345
Type:
Conference Proceedings

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