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"193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform chemistries"

Author(s):
Kajita,T. ( JSR Corp. )
Nishimura,Y.
Yamamoto,M.
Ishii,H.
Soyano,A.
Kataoka,A.
Slezak,M.
Shimizu,M.
Varanasi,P.R.
Jordhamo,G.
Lawson,M.C.
Chen,R.
Brunsvold,W.R.
Li,W.
Allen,R.D.
Ito,H.
Truong,H.D.
Wallow,T.I.
13 more
Publication title:
Advances in Resist Technology and Processing XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4345
Pub. Year:
2001
Vol.:
4345
Pt.:
Two of Two Parts
Page(from):
712
Page(to):
724
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440310 [0819440310]
Language:
English
Call no.:
P63600/4345
Type:
Conference Proceedings

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