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Novel 193-nm photoresist based on Olefin-containing lactones

Author(s):
Yoon,K.-S. ( Samsung Electronics Co., Ltd. )
Jung,D.-W.
Lee,S.
Lee,S.-H.
Choi,S.-J.
Woo,S.-G.
Moon,J.-T.
2 more
Publication title:
Advances in Resist Technology and Processing XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4345
Pub. Year:
2001
Vol.:
4345
Pt.:
Two of Two Parts
Page(from):
688
Page(to):
694
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440310 [0819440310]
Language:
English
Call no.:
P63600/4345
Type:
Conference Proceedings

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