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Characterization of new aromatic polymers for 157-nm photoresist applications

Author(s):
Fender,N. ( IBM Almaden Research Ctr. )
Brock,P.J.
Chau,W.
Bangsaruntip,S.
Mahorowala,A.P.
Wallraff,G.M.
Hinsberg,W.D.
Larson,C.E.
Ito,H.
Breyta,G.
Burnham,K.
Truong,H.D.
Lawson,P.
Allen,R.D.
9 more
Publication title:
Advances in Resist Technology and Processing XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4345
Pub. Year:
2001
Vol.:
4345
Pt.:
One of Two Parts
Page(from):
417
Page(to):
427
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440310 [0819440310]
Language:
English
Call no.:
P63600/4345
Type:
Conference Proceedings

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