Resist materials for 157-nm microlithography: an update
- Author(s):
Willson,C.G. ( Univ. of Texas at Austin ) Tran,H.V. Trinque,B.C. Chiba,T. Yamada,S. Sanders,D.P. Connor,E.F. Grubbs,R.H. Klopp,J.M. Frechet,J.M.J. Thomas,B.H. Shafer,G.J. DesMarteau,D.D. Conley,W. - Publication title:
- Advances in Resist Technology and Processing XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4345
- Pub. Year:
- 2001
- Vol.:
- 4345
- Pt.:
- One of Two Parts
- Page(from):
- 385
- Page(to):
- 395
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440310 [0819440310]
- Language:
- English
- Call no.:
- P63600/4345
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Novel functional nortricyclene polymers and copolymers for 248-and 193-nm chemically amplified resists
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Advances in TFE-based fluoropolymers for 157-nm lithography: a progress report
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Structurally variable cyclopolymers with excellent etch resistance and their application to 193-nm lithography
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Design and study of water-soluble positive- and negative-tone imaging materials
SPIE-The International Society for Optical Engineering |