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Integration of ultrathin resist processes into MPU IC manufacturing flows

Author(s):
Cobb,J.L. ( Motorola )
Conley,W.
Guenther,T.
Huang,F.
Lee,J.J.
Lii,T.
Dakshina-Murthy,S.
Parker,C.
Usmani,S.
Wu,W.
Hector,S.D.
6 more
Publication title:
Advances in Resist Technology and Processing XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4345
Pub. Year:
2001
Vol.:
4345
Pt.:
One of Two Parts
Page(from):
261
Page(to):
272
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440310 [0819440310]
Language:
English
Call no.:
P63600/4345
Type:
Conference Proceedings

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