Process optimization for sub-100-nm gate patterns using phase edge lithography
- Author(s):
- Publication title:
- Advances in Resist Technology and Processing XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4345
- Pub. Year:
- 2001
- Vol.:
- 4345
- Pt.:
- One of Two Parts
- Page(from):
- 200
- Page(to):
- 210
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440310 [0819440310]
- Language:
- English
- Call no.:
- P63600/4345
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
9
Conference Proceedings
Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Performance optimization of the double-exposure slternating PSM for (sub-) 100-nm ICs
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Progress toward developing high performance immersion compatible materials and processes
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |