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Process optimization for sub-100-nm gate patterns using phase edge lithography

Author(s):
Publication title:
Advances in resist technology and processing XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4345
Pub. date:
2001
Vol.:
4345
Pt.:
One of Two Parts
Page(from):
200
Page(to):
210
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440310 [0819440310]
Language:
English
Call no.:
P63600/4345
Type:
Conference Proceedings

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