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Novel high-performance ArF resist for sub-100-nm lithography

Author(s):
Lee,G. ( Hyundai Electronics Industries Co., Ltd. )
Koh,C.-W.
Jung,J.-C.
Jung,M.-H.
Kong,K.-K.
Kim,J.-S.
Shin,K.-S.
Choi,S.-J.
Kim,Y.-S.
Choi,Y.-J.
Kim,D.-B.
6 more
Publication title:
Advances in resist technology and processing XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4345
Pub. date:
2001
Vol.:
4345
Pt.:
One of Two Parts
Page(from):
150
Page(to):
158
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440310 [0819440310]
Language:
English
Call no.:
P63600/4345
Type:
Conference Proceedings

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