Blank Cover Image

Thermal properties of COMA materials

Author(s):
Rushkin,I.L. ( Arch Chemicals, Inc. )
Beauchemin,B.T.
Dimov,O.N.
Kocab,T.
Medina,A.N.
Sarubbi,T.R.
Bowden,M.J.
2 more
Publication title:
Advances in Resist Technology and Processing XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4345
Pub. Year:
2001
Vol.:
4345
Pt.:
One of Two Parts
Page(from):
131
Page(to):
137
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440310 [0819440310]
Language:
English
Call no.:
P63600/4345
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Dissolution properties of cycloolefin-maleic-anhydride-based resist resins

Rushkin,I.L., Houlihan,F.M., Kometani,J.M., Hutton,R.S., Nalamasu,O., Reichmanis,E., Dimov,O., Medina,A.N., …

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Design and process of a new DUV ARCH3 resist

Bantu,N., Maxwell,B., Medina,A., Sarubbi,T.R., Toukhy,M.A., Schacht,H., Falcigno,P.A., Munzel,N., Petschel,K., …

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Mechanism studies of scanning electron microscope measurement effects on 193-nm photoresists and the development of improved line-width measurement methods

Sarrubi,T.R., Ross,M.F., Neisser,M., Kocab,T., Beauchemin,B.T., Livesay,W.R., Wong,S.S., Ng,W.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Thermal stability of silicon-containing methacrylate-based bilayer resist for 193-nm lithography

White,D., Beauchemin,B.T.,Jr., Blakeney,A.J., Steinhausler,T.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Lithographic properties of novel acetal-derivatized hydroxy styrene polymers

Malik, S., Blakeney, A. J., Ferreira, L., Maxwell, B., Whewell, A., Sarubbi, T. R., Bowden, M. J., Driessche, V. Van, …

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Lithographic behavior of carboxylate-based dissolution inhibitors and the effect of blending

Houlihan,F.M., Yan,Z., Reichmanis,E., Dabbagh,G., Bolan,K.J., Nalamasu,O., Rushkin,I.L., Dimov,O.N.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Optimization of 193-nm single-layer resists through statistical design

Cabor, A. H., Dimov, O., Medina, A. N., Neisser, M. O., Slater, S. G., Wang, R. H., Houlihan, F. M., Cirelli, R. A., …

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Selectively esterified novolac resins:a study of resist properties as a function of novolac molecular weight and composition

Jeffries,A.T.III, Brzozowy,D.J., Beauchemin,B.T., Naiini,A.A., Fitzgerald,E.A., Gallagher-Wetmore,P.M.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Effect of PAC structure and resist morphology on the control of surface inhibition in positive photoresist systems

B.T. Beauchemin, Jr., R.J. Hurditch, M.A. Toukhy, A.J. Blakeney

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings Optimizing a DUV positive resist for metal layers

Malik, S., Maxwell, B., Gandolfi, A., Ornaghi, A., Whewell, A., Uhnak, K., Volpi, S., Driessche, V. Van, Sarubbi, T. R., …

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Choice of amines as stabilizers for chemically amplified resist systems

Ferreira,L., Malik,S., Sarubbi,T.R., Blakeney,A.J., Maxwell,B.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Adjustment of bilayer optical properties and the effect on imaging and etching performance

Neisser,M.O., Biafore,J.J., Foster,P., Spaziano,G., Sarubbi,T.R., Driessche,V.Van, Grozev,G., Tzviatkov,P.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12