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Improved lithographic performance for resists based on polymers having a vinyl ether-maleic anhydride (VEMA) backbone

Author(s):
Tanaka,T. ( Samsung Electronics Co., Ltd. )
Choi,S.-J.
Jung,D.-W.
Lee,S.
Lee,S.-H.
Kang,Y.
Woo,S.-G.
Moon,J.-T.
Kavanagh,R.J.
Barclay,G.G.
Orsula,G.W.
Mattia,J.
Caporale,S.
Adams,T.G.
Kang,D.
10 more
Publication title:
Advances in Resist Technology and Processing XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4345
Pub. Year:
2001
Vol.:
4345
Pt.:
One of Two Parts
Page(from):
119
Page(to):
130
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440310 [0819440310]
Language:
English
Call no.:
P63600/4345
Type:
Conference Proceedings

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