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Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs

Author(s):
Choi,S.-J. ( DongJin Semichem Co., Ltd )
Choi,Y.-J.
Kim,Y.-S.
Kim,S.-D.
Kim,D.-B.
Kim,J.-H.
Koh,C.-W.
Lee,G.
Jung,J.-C.
Baik,K.-H.
5 more
Publication title:
Advances in Resist Technology and Processing XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4345
Pub. Year:
2001
Vol.:
4345
Pt.:
One of Two Parts
Page(from):
94
Page(to):
105
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440310 [0819440310]
Language:
English
Call no.:
P63600/4345
Type:
Conference Proceedings

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