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Impact of optimized illumination upon simple lambda-based design rules for low-K1 lithography

Author(s):
Publication title:
Metrology, inspection, and process control for microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4344
Pub. date:
2001
Vol.:
4344
Page(from):
797
Page(to):
808
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440303 [0819440302]
Language:
English
Call no.:
P63600/4344
Type:
Conference Proceedings

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