Impact of attenuated PSM repair for 130-nm polygate lithography process
- Author(s):
Shi,X. ( ASML MaskTools Inc. ) Hsu,S. Socha,R.J. Chen,J.F. Cheng,A. Su,C. Cheng,J. Chen,A. Lin,H. Wang,D. Chen,D. Lin,A. Conley,W. Metzger,D. Imamura,P.H. Sherrill,M.J. - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4344
- Pub. Year:
- 2001
- Page(from):
- 707
- Page(to):
- 715
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440303 [0819440302]
- Language:
- English
- Call no.:
- P63600/4344
- Type:
- Conference Proceedings
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