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Impact of attenuated PSM repair for 130-nm polygate lithography process

Author(s):
Shi,X. ( ASML MaskTools Inc. )
Hsu,S.
Socha,R.J.
Chen,J.F.
Cheng,A.
Su,C.
Cheng,J.
Chen,A.
Lin,H.
Wang,D.
Chen,D.
Lin,A.
Conley,W.
Metzger,D.
Imamura,P.H.
Sherrill,M.J.
11 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4344
Pub. Year:
2001
Page(from):
707
Page(to):
715
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440303 [0819440302]
Language:
English
Call no.:
P63600/4344
Type:
Conference Proceedings

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