193-nm photoresist shrinkage after electron-beam exposure

193-nm photoresist shrinkage after electron-beam exposure

Author(s):

Su,B. ( Applied Materials )
Eytan,G.
Romano,A.R.

Publication title:

Metrology, Inspection, and Process Control for Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4344

Pub. Year:

2001

Page(from):

695

Page(to):

706

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440303 [0819440302]

Language:

English

Call no.:

P63600/4344

Type:

Conference Proceedings

Details

TDL ID:	ZA00012060
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
Conf. info. (Number):	2001 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2001.02.26-2001.03.01

Similar Items:

1 Conference Proceedings Investigation of electron beam stabilization of 193-nm photoresists Kim,M.-S., Park,J.-W., Kim,H.-J., Jun,B.-J., Gil,M.-G., Kim,B.-H., Ross,M.F., Livesay,W.R. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Photoresist outgassing at 157-nm exposure Hien,S., Angood,S., Ashworth,D., Basset,S., Bloomstein,T.M., Dean,K.R., Kunz,R.R., Miller,D.A., Patel,S., Rich,G.K. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Negative photoresist for 157-nm microlithography: a progress report Conley, W., Trinque, B.C., Miller, D.A., Zimmerman, P., Kudo, T., Dammel, R.R., Romano, A.R., Willson, C.G. SPIE-The International Society for Optical Engineering	8 Conference Proceedings A new monocyclic fluoropolymer for 157-nm and 193-nm photoresists Houlihan, F., Sakamuri, R., Hamilton, K., Dimerli, A., Rentkiewicz, D., Romano, A., Dammel, R. R., Wei, Y., Stepanenko, … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Protecting groups for 193-nm photoresists Allen,R.D., Sooriyakumaran,R., Opitz,J., Wallraff,G.M., DiPietro,R.A., Breyta,G., Hofer,D.C., Kunz,R.R., Jayaraman,S., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Double exposure using 193nm negative tone photoresist R. Kim, T. Wallow, J. Kye, H. J. Levinson, D. White SPIE - The International Society of Optical Engineering
4 Conference Proceedings Modification of 193-nm (ArF) photoresists by electron beam stabilization Martens,P.M., Yamamoto,S., Edamatsu,K., Uetani,Y., Pain,L., Palla,R., Ross,M.F., Livesay,W.R. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Electron beam metrology of 193-nm resists at ultralow voltage Sullivan, N.T., Dixson, R., Bunday, B.D., Mastovich, M.E., Knutrud, P.C., Fabre, P., Brandom, R. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Influence of backbone chemistry on the post-exposure bake temperature sensitivity of 193-nm photoresists Bae, Y.C., Ogawa, T., Kavanagh, R.J., Kobayashi, T., Lindsay, T., Tanaka, T., Xu, C.B., Orsula, G., DeSisto, J., … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Polymer-platform-dependent characteristics of 193-nm photoresists Opitz, J., Allen, R. D., Breyta, G., Hofer, D. C., Sundararajan, N., Ober, C. K. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Ultrathin photoresists for 193-nm lithography Peters, R.D., Amblard, G.R., Lee, J.-J., Guenther, T. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Implications of immersion lithography on 193-nm photoresists Taylor, J.C., Chambers, C.R., Deschner, R., LeSuer, R.J., Conley, W.E., Burns, S.D., Willson, C.G. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12