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Extended ATHENA alignment performance and application for the 100-nm technology node

Author(s):
Navarro,R. ( ASML )
Keij,S.
Boef,A.J.den
Schets,S.
Bilsen,F.van
Simons,G.
Schuurhuis,R.
Burghoorn,J.
3 more
Publication title:
Metrology, inspection, and process control for microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4344
Pub. date:
2001
Vol.:
4344
Page(from):
682
Page(to):
694
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440303 [0819440302]
Language:
English
Call no.:
P63600/4344
Type:
Conference Proceedings

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