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Wafer-induced reading error in metal sputtering process

Author(s):
Kim,D.-J. ( Samsung Electronics Co. )
Oh,S.-H.
Yeo,G.-S.
Bae,Y.-G.
Kim,J.-H.
Kim,Y.-H.
1 more
Publication title:
Metrology, inspection, and process control for microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4344
Pub. date:
2001
Vol.:
4344
Page(from):
667
Page(to):
672
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440303 [0819440302]
Language:
English
Call no.:
P63600/4344
Type:
Conference Proceedings

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