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Implementation of spectroscopic critical dimension (SCD) (TM) for gate CD control and stepper characterization

Author(s):
Allgair,J.A. ( Motorola )
Benoit,D.C.
Drew,M.
Hershey,R.R.
Litt,L.C.
Herrera,P.P.
Whitney,U.K.
Guevremont,M.
Levy,A.
Lakkapragada,S.
5 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4344
Pub. Year:
2001
Page(from):
462
Page(to):
471
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440303 [0819440302]
Language:
English
Call no.:
P63600/4344
Type:
Conference Proceedings

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