Monitoring printing fidelity with image correlation measurements on the CD SEM

Monitoring printing fidelity with image correlation measurements on the CD SEM

Author(s):

Archie,C.N. ( IBM Advanced Semiconductor Technology Ctr. )
Solecky,E.P.
Hayes,T.S.
Banke,G.W.

Publication title:

Metrology, Inspection, and Process Control for Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4344

Pub. Year:

2001

Page(from):

385

Page(to):

394

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440303 [0819440302]

Language:

English

Call no.:

P63600/4344

Type:

Conference Proceedings

Details

TDL ID:	ZA00012060
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
Conf. info. (Number):	2001 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2001.02.26-2001.03.01

Similar Items:

1 Conference Proceedings Three-dimensional top-down metrology: a viable alternative to AFM or cross-section? Solecky,E.P., Archie,C.N., Hayes,T.S., Banke,G.W., Cornell,R.S. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Benchmarking of advanced CD-SEMs against the new unified specification for sub-0.18-ｦﾌm lithography Deleporte,A.G., Allgair,J., Archie,C.N., Banke,G.W., Postek,M.T., Schlesinger,J.E., Vladar,A.E., Yanof,A.W. SPIE - The International Society for Optical Engineering
2 Conference Proceedings New apparent beam width artifact and measurement methodology for CD-SEM resolution monitoring Mayer, J.A., Huizenga, K.J., Solecky, E.P., Archie, C.N., Banke, G.W. Jr.,, Cogley, R.M., Nathan, C., Robert, J.M. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis Sendelbach, M., Archie, C.N., Banke, B., Mayer, J., Nii, H., Herrera, P., Hankinson, M. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Practical monitor and control of SEM astigmatism in manufacturing Dupuis,S.R., Hayes,T.S., Archie,C.N., Solecky,E.P. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Image processing for SEMs: is this the way to go for CD metrology? Eric P. Solecky, Charles N. Archie SPIE - The International Society of Optical Engineering
4 Conference Proceedings Improving sub-150-nm lithography and etch CD-SEM correlations to AFM and electrical test Solecky, E.P., Mayer, J., Archie, C.N. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology Banke, B., Archie, C.N., Sendelbach, M., Robert, J., Slinkman, J.A., Kaszuba, P., Kontra, R., DeVries, M., Solecky, E.P. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Characterizing and understanding stray tilt: the next major contributor to CD SEM tool matching Solecky, E.P., Archie, C.N., Mayer, J., Cornell, R.S., Adan, O. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Contact holes:a challenge for signal collection efficiency and measurement algorithms Solecky,E., Archie,C.N. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-μm lithography Deleporte,A.G., Allgair,J., Archie,C.N., Banke,G.W., Postek,M.T., Schlesinger,J.E., Vladar,A.E., Yanof,A.W. SPIE-The International Society for Optical Engineering	12 Conference Proceedings The coming of age of tilt CD-SEM B. Bunday, J. Allgair, E. Solecky, C. Archie, N. G. Orji, J. Beach, O. Adan, R. Peltinov, M. Bar-zvi, J. Swyers SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12