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Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography

Author(s):
Fritze,M. ( MIT Lincoln Lab. )
Tyrrell,B.
Astolfi,D.K.
Davis,P.
Wheeler,B.
Mallen,R.
Jarmolowicz,J.
Cann,S.G.
Chan,D.Y.
Rhyins,P.D.
Mastovich,M.E.
Sullivan,N.T.
Brandom,R.
Carney,C.
Blachowicz,B.A.
10 more
Publication title:
Metrology, inspection, and process control for microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4344
Pub. date:
2001
Vol.:
4344
Page(from):
334
Page(to):
343
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440303 [0819440302]
Language:
English
Call no.:
P63600/4344
Type:
Conference Proceedings

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