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Lens-heating-induced focus drift of l-line step and scan: correction and control in a manufacturing environment

Author(s):
Ho,G.H. ( ASML )
Cheng,A.T.
Chen,C.-J.
Fang,C.-K.
Li,M.-C.
Chang,I-C.
Chu,P.-T.
Chu,Y.C.
Shu,K.-Y.
Huang,C.-Y.
Yeh,H.-L.
Shiao,H.C.
Lan,H.K.
8 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4344
Pub. Year:
2001
Page(from):
289
Page(to):
296
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440303 [0819440302]
Language:
English
Call no.:
P63600/4344
Type:
Conference Proceedings

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