Optimization of segmented alignment marks for advanced semidonductor fabrication processes
- Author(s):
- Wu,Q. ( IBM Mircroelectronics )
- Lu,Z.G.
- Williams,G.
- Zach,F.X.
- Liegl,B.
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4344
- Pub. Year:
- 2001
- Page(from):
- 234
- Page(to):
- 244
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440303 [0819440302]
- Language:
- English
- Call no.:
- P63600/4344
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Is model-based optical proximity correction ready for manufacturing? Study on 0.12- and 0.175-μm DRAM technology
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
Trans Tech Publications |
10
Conference Proceedings
Segmented alignment mark optimization and signal strength enhancement for deep trench process
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Magnetic liquid encapsulated Kyropoulos (MLEK) crystal growth of indium phosphide for photorefractive optimization
Society of Photo-optical Instrumentation Engineers |
11
Conference Proceedings
Prediction of Ring Rolling Process of PM Ti2AlNb Alloy by Hot Isostatic Pressing Based on Gleeble-3800 and FE Simulation
Trans Tech Publications |
Society of Photo-optical Instrumentation Engineers |
Trans Tech Publications |