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Characterization of optical proximity correction features

Author(s):
Allgair,J.A. ( Motorola )
Ivy,M.
Lucas,K.
Sturtevant,J.L.
Elliott,R.C.
Mack,C.A.
MacNaughton,C.W.
Miller,J.D.
Pochkowski,M.
Preil,M.E.
Robinson,J.C.
Santos,F.
7 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4344
Pub. Year:
2001
Page(from):
200
Page(to):
207
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440303 [0819440302]
Language:
English
Call no.:
P63600/4344
Type:
Conference Proceedings

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