W-CMP alignment using ASML's ATHENA system on an I-line stepper
- Author(s):
Prasad,K.J. ( Chartered Semiconductor Manufacturing, Ltd. ) Rajan,D.A. Tan,Y.K. Sun,G.P. Morgan,S. Phillips,M. Ng,B. - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4344
- Pub. Year:
- 2001
- Page(from):
- 79
- Page(to):
- 88
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440303 [0819440302]
- Language:
- English
- Call no.:
- P63600/4344
- Type:
- Conference Proceedings
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