Blank Cover Image

Development of data conversion system for electron-beam projection lithography (EPL) mask

Author(s):
Yamada,Y. ( NEC Corp. )
Kobinata,H.
Tamura,T.
Miyasaka,M.
Sakamoto,T.
Ogawa,Y.
Takada,K.
Yamashita,H.
Nozue,H.
4 more
Publication title:
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4343
Pub. Year:
2001
Page(from):
473
Page(to):
482
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440297 [0819440299]
Language:
English
Call no.:
P63600/4343
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Optimization of pattern shape in electron-beam cell projection lithography

Ema,T., Yamashita,H., Nakajima,K., Kobinata,H., Nozue,H.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Stitching accuracy measurement system for EB direct writing and electron-beam projction lithography (EPL)

Tamura,T., Ema,T., Nozue,H., Sugahara,T., Sugano,A., Nitta,J.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Optimization of PHS-based chemically amplified negative resist for 100-kV electron-beam projection lithography(EPL)

Miyasaka,M., Tokunaga,K., Koba,F., Yamashita,H., Nakajima,K., Nozue,H.

SPIE - The International Society for Optical Engineering
8 Conference Proceedings Supercritical resist dry technique for electron-beam projection lithography (EPL)

Petricich, G., Suzuki, K., Munemasa, J., Yoshikawa, T., Kawakami, N., Shimizu, S., Watanabe, M.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Mask bias effects in e-beam cell-projection lithography

Ema,T., Yamashita,H., Nakajima,K., Nozue,H,

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Stencil masks for electron-beam projection lithography

Kurihara,K., Iriguchi,H., Motoyoshi,A., Tabata,T., Takahashi,S., Iwamoto,K., Okada,I., Yoshihara,H., Noguchi,H.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings One-dimensional calculation method for proximity effect correction in cell projection electron-beam direct writing

Yamada,Y., Tamura,T., Nakajima,K., Nozue,H.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings EPL mask data conversion system EPLON

Kato, K., Nishizawa, K., Haruki, T., Inoue, T.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Defect printability analysis in electron-beam cell projection lithography

Itoh,K., Yamashita,H., Ema,T., Nozue,H.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Novel electron optics for large subfield electron-beam projection lithography (EPL)

Fukui, S., Shimizu, H., Ren, W., Suzuki, S., Okamoto, K.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings 0.15-ｦﾌm pattern formation using cell projection electron-beam direct writing with variable shot size

Tamura,T., Yamashita,H., Nakajima,K., Nozue,H.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings EPL stencil mask defect inspection system using transmission electron beam

Yamamoto, J., Iwasaki, T., Yamabe, M., Anazawa, N., Maruyama, S., Tsuta, K.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12