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Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks

Author(s):
Magg,C. ( Photronics/IBM Microelectronics )
Lercel,M.J.
Lawliss,M.
Ackel,R.
Caldwell,N.
Kindt,L.
Racette,K.C.
Williams,C.
Reu,P.L.
4 more
Publication title:
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4343
Pub. date:
2001
Vol.:
4343
Page(from):
374
Page(to):
382
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440297 [0819440299]
Language:
English
Call no.:
P63600/4343
Type:
Conference Proceedings

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