High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making | 東京工業大学附属図書館文献データベース

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High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making

Author(s):

Huang,W.-S. ( IBM Microelectronics )

Mahorowala,A.P.

Angelopoulos,M.

Publication title:

Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4343

Pub. Year:

2001

Page(from):

268

Page(to):

277

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440297 [0819440299]

Language:

English

Call no.:

P63600/4343

Type:

Conference Proceedings

Details

TDL ID:	ZA00012059
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2001 : 5th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2001.02.27-2001.03.01

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