Blank Cover Image

Overlay and critical dimension control in 100-nm ULSI processes using TaBN x-ray masks and the XRA x-ray stepper

Author(s):
Fujii,K. ( Association of Super-Advanced Electronics Technologies )
Tanaka,Y.
Iwanoto,T.
Tsuboi,S.
Sumitani,H.
Taguchi,T.
Suzuki,K.
Matsui,Y.
3 more
Publication title:
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4343
Pub. Year:
2001
Page(from):
155
Page(to):
163
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440297 [0819440299]
Language:
English
Call no.:
P63600/4343
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Fabrication of NIST-format x-ray masks with 4-Gb DRAM patterns

Tanaka,Y., Fujii,K., Suzuki,K., Iwamoto,T., Tsuboi,S., Matsui,Y.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Precise x-ray mask writing technology using advanced 100-kV EB writer EB-X3

Nakayama,Y., Watanabe,H., Tsuboi,S., Aoyama,H., Ezaki,M., Matsui,Y., Morosawa,T., Oda,M.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Analysis of x-ray mask distortion

Tanaka,Y., Yoshihara,T., Tsuboi,S., Fujii,K., Suzuki,K.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Critical dimension (CD) control in 157-nm lithography

Hori, S., Yoshihara, K., Kyoda, H., Matsui, H., Furukawa, T., Miyoshi, S., Kawaguchi, E., Itani, T.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Up-to-date activities of PXL (proximity x-ray lithography)

Matsui,Y., Taguchi,T., Nakayama,Y., Kikuchi,Y., Tsuboi,S., Sumitani,H.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Delineation performances of advanced 100-kV EB writer on x-ray membrane mask

Nakayama,Y., Aoyama,H., Tsuboi,S., Watanabe,H., Kikuchi,Y., Ezaki,M., Matsui,Y., Morosawa,T., Saito,K., Ohki,S., …

SPIE - The International Society for Optical Engineering
4 Conference Proceedings Production x-ray lithography stepper for 100-nm device fabrication

Li,X., Miyatake,T., Hirose,S., Hirose,M., Fujii,K., Suzuki,K.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Advanced FIB mask repair technology for 100-nm/ArF lithography

Hagiwara, R., Yasaka, A., Aita, K., Takaoka, O., Koyama, Y., Kozakai, T., Doi, T., Muramatsu, M., Suzuki, K., Sugiyama, …

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Application of advanced 100-kV EB writer EB-X3 for 100-nm node x-ray mask fabrication

Watanabe,H., Nakayama,Y., Tsuboi,S., Ezaki,M., Aoyama,H., Matsui,Y., Morosawa,T., Oda,M.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Process development of 6-in EUV mask with TaBN absorber

Shoki, T., Hosoya, M., Kinoshita, T., Kobayashi, H., Usui, Y., Ohkubo, R., Ishibashi, S., Nagarekawa, O.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Critical defects in x-ray masks for 100-nm patterns

Watanabe,H., Matsui,Y.

SPIE - The International Society for Optical Engineering
12 Conference Proceedings Stress relaxation of EB resist for x-ray mask fabrication

Sasahara,A., Kumada,T., Kise,K., Sumitani,H.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12