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Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution

Author(s):
Soufli,R. ( Lawrence Livermore National Lab. )
Spiller,E.A.
Schmidt,M.A.
Davidson,J.C.
Grabner,R.F.
Gullikson,E.M.
Kaufmann,B.B.
Mrowka,S.
Baker,S.L.
Chapman,H.N.
Hudyma,R.M.
Taylor,J.S.
Walton,C.C.
Montcalm,C.
9 more
Publication title:
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4343
Pub. Year:
2001
Page(from):
51
Page(to):
59
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440297 [0819440299]
Language:
English
Call no.:
P63600/4343
Type:
Conference Proceedings

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