Simulation of picosecond pulsed laser ablation of silicon: the molecular-dynamics thermal-annealing model

Simulation of picosecond pulsed laser ablation of silicon: the molecular-dynamics thermal-annealing model

Author(s):

Lorazo,P. ( Ecole Polytechnique de Montreal )
Lewis,L.J.
Meunier,M.

Publication title:

Commercial and biomedical applications of ultrashort pulse lasers; laser plasma generation and diagnostics : 23 January, 2001, San Jose, [California] USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4276

Pub. Year:

2001

Page(from):

57

Page(to):

61

Pages:

5

Pub. info.:

Bellingham, Washington: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819439543 [0819439541]

Language:

English

Call no.:

P63600/4276

Type:

Conference Proceedings

Details

TDL ID:	ZA00011992
Series ID:	PA00000029
Conf. info. (Name):	SPIE LASE : Commercial and biomedical applications of ultrashort pulse lasers
Conf. info. (Number):	2001
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2001.01.23

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