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Optimization of the planarizing performance of a DUV organic bottom antireflective coating for via first dual-damascene process: cooperation to achieve material and process characterization

Author(s):
Williams,P.
Martin,A.
Strobl,M.
Roberts,W.R.
Goodwin,F.G.
Volkel,L.
Feicke,A.
Trautman,S.
Lamb Ⅲ,J.E.
4 more
Publication title:
Microlithographic Techniques in Integrated Circuit Fabrication II
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4226
Pub. Year:
2000
Page(from):
160
Page(to):
168
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438980 [0819438987]
Language:
English
Call no.:
P63600/4226
Type:
Conference Proceedings

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