Gate oxide Integrity Response as a Function of Near the Surface Crystal Defects Morphology

Gate oxide Integrity Response as a Function of Near the Surface Crystal Defects Morphology

Author(s):

Borionetti,G.

Publication title:

High Purity Silicon VI : proceedings of the sixth International Symposium

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4218

Pub. Year:

2000

Page(from):

456

Page(to):

466

Pages:

11

Pub. info.:

Pennington, N.J. — Bellingham, Wash.: Electrochemical Society — SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9781566772846 [1566772842]

Language:

English

Call no.:

P63600/4218

Type:

Conference Proceedings

Details

TDL ID:	ZA00011937
Series ID:	PA00000029
Conf. info. (Name):	Internationa Symposium on High Purity Silicon [ SPIE 0819438901 ] : Meeting of the Electrochemical Society
Conf. info. (Number):	6th : 198th
Conf. info. (Venue):	Phoenix, AZ, USA
Conf. info. (Date):	2000.10.22-2000.10.27

Similar Items:

1 Conference Proceedings Gate oxide Integrity Response as a Function of Near the Surface Crystal Defects Morphology Borionetti, G., Godio, P., Bonoli, F., Comara, M., Orizio, R., Falster, R. Electrochemical Society	7 Conference Proceedings COPs/particles discrimination using an automated surface inspection tool Lorenzi, G., Nguyen, K.H., Sanna, C., Orizio, R., Borionetti, G. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Investigation on Low Density Defects in Czochralski Silicon Crystals: Their Detectability, Formation Kinetics and Influence on Gate Oxide Integrity Borionetti, G., Godio, P., Porrini, M., Ilic, S. Electrochemical Society	8 Conference Proceedings CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY Mertens, P.W., Meuris, M., Schmidt, H.F., Verhaverbeke, S., Heyns, M.M., Carr, P., Graeff, D., Schnegg, A., Kubota, M., … Electrochemical Society
3 Conference Proceedings Study on the Effect of Silicon Surface Cleaning Processes on Gate Oxide Integrity Corradi, A., Borzoni, E., Godio, P., Borionetti, G. MRS - Materials Research Society	9 Conference Proceedings MODELLING OF CRYSTAL ORIGINATED PARTICLES AND THEIR IMPACT ON GATE OXIDE INTEGRITY Bearda, T., Mertens, P.W., Woerlee, P.H., Wallinga, H., Sebmolke, R., Heyns, M. Electrochemical Society
4 Conference Proceedings INFLUENCE OF POLYSILICON AND CRUCIBLE PURITY ON THE MINORITY CARRIER RECOMBINATION LIFETIME OF CZOCHRALSKI SILICON CRYSTALS Borionetti, G., Porrini, M., Geranzani, P., Orizio, R., Falster, R. Electrochemical Society	10 Conference Proceedings MODELLING OF CRYSTAL ORIGINATED PARTICLES AND THEIR IMPACT ON GATE OXIDE INTEGRITY Bearda, T., Mertens, P.W., Woerlee, P.H., Wallinga, H., Sebmolke, R., Heyns, M. Electrochemical Society
5 Conference Proceedings Impact of silicon substrate oxygen precipitation fine tuning on high density memories retention time Borionetti, G., Falster, R., Bertolini, S., Cornara, M., Olmo, M., Chalmers, G., Childs, R., Marcuccilli, G. Electrochemical Society	11 Conference Proceedings Gettering of copper and iron to extended surface defects in silicon Coteau,M.D.de, Wilshaw,P.R., Falster,R. Trans Tech Publications
6 Conference Proceedings Crystal originated particles (COPs), bulk defects including the OSF ring, gate oxide integrity (GOI), and DRAM yield Rozgonyi, G., Tamatsuka, M., Bae, K.-M., Gonzales, F. Electrochemical Society	12 Conference Proceedings INFLUENCE OF GROWN - IN DEFECTS IN CZ CRYSTAL ON GATE OXIDE INTEGRITY Sano, M., Hourai, M., Sumita, S., Shigematsu, T. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12