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Oxygen Precipitation Behavior and its Optimum Condition for Internal Gettering and Mechanical Strength in Epitaxial and Polished Silicon Wafers

Author(s):
Sueoka,K.
Akatsuka,M.
Onno,T.
Asayama,E.
Koike,Y.
Adachi,N.
Sadamitsu,S.
Katahama,H.
3 more
Publication title:
High Purity Silicon VI : proceedings of the sixth International Symposium
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4218
Pub. date:
2000
Vol.:
4218
Page(from):
164
Page(to):
179
Pages:
16
Pub. info.:
Pennington, N.J. — Bellingham, Wash.: Electrochemical Society — SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9781566772846 [1566772842]
Language:
English
Call no.:
P63600/4218
Type:
Conference Proceedings

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