Blank Cover Image

Low Temperature Process for High Density Thin Film Integrated Capacitors

Author(s):
Publication title:
2000 International Conference on High-Density Interconnect and Systems Packaging, 25-28 April 2000, The Adam's Mark Hotel, Denver, Colorado, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4217
Pub. Year:
2000
Page(from):
342
Page(to):
345
Pages:
4
Pub. info.:
Reston, VA — Bellingham, Wash.: IMAPS — SPIE-The International Society for Optical
ISSN:
0277786X
ISBN:
9780930815608 [0930815602]
Language:
English
Call no.:
P63600/4217
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings MOCVD of Alkaline Earth Titanates for Integrated rf Capacitors

Stauf, G. T., Seegel, C., Watts, R. K., O'Bryan, H. M.

MRS - Materials Research Society
7 Conference Proceedings MOCVD of Nb substituted SrBi2TaO9 for integrated ferroelectric capacitors

Hendrix, B. C., Classman, T. E., Roeder, J. F.

MRS-Materials Research Society
2 Conference Proceedings Thin Film High K Dieletrics for Integrated Passive Devices

Stauf,Gregory T., Carl,Ralph, Bilodeau,Steve, Buskirk,Peter Van, Watts,Kent

SPIE-The International Society for Optical Engineering
8 Conference Proceedings High-Density, Low-Loss MOS Capacitors for Integrated RF Decoupling

Roozeboom, F., Elfrink, R.J.G., Rijks, G.S.M., Th, Verhoeven, J.F.C.M., Kemmeren, A., van den Meerakker, J.E.A.M.

IMAPS
3 Conference Proceedings Low Temperature Deposition of Ge Thin Films for Phase Change Memory

T. Chen, C. Xu, W. Hunks, M. Stender, G.T. Stauf

Electrochemical Society
9 Conference Proceedings LOW TEMPERATURE DEPOSITION OF HIGH DIELECTRIC CONSTANT THIN FILMS FOR DECOUPLING CAPACITOR APPLICATIONS

Li, P., Gittleman, B., Lu, T.-M.

Materials Research Society
4 Conference Proceedings Properties of Zr-substituted (Ba, Sr)TiO3 thin films for integrated capacitors

Stauf, G. T., Chen, P. S., Paw, W., Roeder, J. F., Ayguavives, T., Maria, J-P., Kingon, A. I.

MRS-Materials Research Society
10 Conference Proceedings Low Temperature Processing of SiO2 Thin Films by PECVD Technique Using an Inductively-Coupled High-Density RF Plasma Source

Joshi, P., Droes, S., Flores, J., Voutsas, T., Hartzel, J.

Electrochemical Society
5 Conference Proceedings INVESTIGATION OF SECOND HARMONIC GENERATION IN MOCVD GROWN BARIUM TITANATE THIN FILMS

Bihari, Bipin, Jiang, Xin Li, Kumar, Jayant, Stauf, Gregory T., Buskirk, Peter C. Van

MRS - Materials Research Society
11 Conference Proceedings High energy density capacitors fabricated by thin film technology

Wagner, A. V., Johnson, G. W., Barbee, T. W. Jr.

MRS-Materials Research Society
6 Conference Proceedings High Density Plasma Processing of Microcrystalline Si Thin Films

Joshi, P.C., Voutsas, A.T., Hartzell, J.W.

Materials Research Society
12 Conference Proceedings Thin Film Capacitors Embedded into High Density Printed Circuit Boards

Kingon, Angus I., Kim, Taeyun, Vilarinho, Paul, Maria, Jon-Paul, Crosswell, Robert T.

IMAPS
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12