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Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process

Author(s):
Palmer,S.R.
Mason,M.E.
Randall,J.N.
Aton,T.
Kim,K.
Tritchkov,A.V.
Burdorf,J.
Rieger,M.L.
Stirniman,J.P.
4 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
921
Page(to):
932
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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