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Comparison study between stepper (5x) and scanner (4x) for gate CD control using total process-proximity-based correction

Author(s):
Nam,B.H.
Kim,D.S.
Cho,B.H.
Seok,N.K.
Jeong,J.K.
Kim,S.P.
Kang,S.W.
Hwang,Y.J.
Song,Y.J.
4 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
793
Page(to):
800
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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