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Double-step process for manufacturing reticle to reduce gate CD variation

Author(s):
Kozuma,M.
Komatsu,M.
Arakawa,R.
Kubo,S.
Takahashi,T.
Jensen,J.
Bang,H.S.
Lee,I.H.
Shin,C.
Kim,H.-S.
Park,K.W.
6 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. date:
2000
Vol.:
4186
Page(from):
787
Page(to):
792
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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