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Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication

Author(s):
Magg,C.
Lercel,M.J.
Lawliss,M.
Kwong,R.W.
Huang,W.-S.
Angelopoulos,M.
1 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. date:
2000
Vol.:
4186
Page(from):
707
Page(to):
716
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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