Blank Cover Image

High-accuracy laser mask repair system LM700A

Author(s):
Yoshino,Y.
Morishige,Y.
Watanabe,S.
Kyusho,Y.
Ueda,A.
Haneda,T.
Oomiya,M.
2 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
663
Page(to):
669
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Laser mask repair system LM700A

Ueda,A., Yoshino,Y., Morishige,Y., Watanabe,S., Kyusho,Y., Haneda,T., Ohmiya,M.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Femtosecond laser ablation of Cr-SiO2 binary mask

Okamoto, T., Morishige, Y., Ohmura, E., Sano, T., Miyamoto, I.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings High-accuracy laser mask repair technology using ps UV solid state laser

Morishige,Y.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

T. Kumazaki, T. Suzuki, S. Tanaka, R. Nohdomi, M. Yoshino

Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Picosecond laser system for photomask repair with nanometer accuracy

Togawa, T., Ueda, A., Morishige, Y., Suzuki, Y.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Dynamic image placement accuracy of a stencil mask

Takenaka, H., Yamashita, H., Takahashi, K., Tomo, Y., Watanabe, M., Iwasaki, T., Yamamoto, J., Yamabe, M.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Laser mask repair technology for 256-Mb DRAM reticle

Haneda,T., Shimanaka,T., Wakabayashi,K., Yoshino,Y.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Practical laser mask repair in the contemporary production environment

T. Robinson, R. White, M. Archuletta, R. Bozak

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Recent progress in repair accuracy of the focused ion-beam mask repair system

Aita,K., Yasaka,A., Kitamura,T., Matsumura,H., Satoh,Y., Nakamura,H., Fujikawa,J., Tsuchiya,K., Noguchi,S.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Pattern-data preparation method to enchance high-throughput mask fabrication in variable-shaped e-beam writing system

Hara,S., Murakami,E., Magoshi,S., Koyama,K., Anze,H., Ogawa,Y., Kabeya,A., Ooki,S., Saito,T., Fujii,T., Sakamoto,S., …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings New die-to-database mask inspection system with i-line optics for 256-Mb and 1-Gb DRAMs

Tabata,M., Yamashita,K., Tsuchiya,H., Nomura,T., Inoue,H., Watanabe,T., Tojo,T., Yoshino,H.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings High-performance DUV inspection system for 100-nm generation masks

Tsuchiya, H., Isomura, I., Nakashima, K., Yamashita, K., Watanabe, T., Nishizaka, T., Ikeda, H., Sawa, E., Ikeda, M.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12